Abstract: We will prepare good crystalline and strong photoluminescence Er silicate thin films materials, optimize process parameters, propose the growth mechanism of Er silicate, and study the effect of phase transitions and defects of Er silicate on Er3+ photoluminescence. Finite element analysis method will be adopted to study electromagnetic field distribution inside Er silicate waveguide amplifier. The rate equation and transport equation will simulate the relationship of Er silicate waveguide amplifier gain and Er3+ concentration, waveguide length, pump power and signal power relations, and further get the optimal design of Er silicate optical waveguide amplifier structure. Fabricate the Er silicate optical waveguide amplifier by using Electron beam lithography machine such EBL, FIB, RIE machine, and get optimal micro-machining process parameters. Develop 10dB/cm gain of Er silicate optical waveguide amplifier for silicon photonics integration

 

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