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CMOS as a Research Platform
Baselines > 20um ChemFET 
 
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20um ChemFET
2.5um P-well
1.3um N-well
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Process Flow
NMOS ChemFET GT01

 Version 1.1
Thermal Oxidation
Level 1 Lithography: Source/Drain
Source/Drain Diffusion
Phosphorus Glass Removal
Field Oxidation/Drive-in
Level 2 Lithography: Gate and Contact Area
Gate Oxidation
Silicon Nitride Deposition
Level 3 Lithography: Contact area
Level 4 Lithography: Metal
Gold Deposition
PECVD Oxidation
Level 5 Lithography: Measurement contact
Spin on polyimide
Level 6 Lithography: opening for Conducting polymer
Conducting polymer
Level 7 Mask: Flip-chip Bonding
-James Zhou / March 31, 1998
MiRC, Georgia Tech